首页> 外国专利> GALLIUM NITRIDE BASED SEMICONDUCTOR LIGHT EMITTING DEVICE AND METHOD FOR MANUFACTURING THEREOF USING SURFACE MORPHOLOGY OF HOMOGENEOUS NITRIDE SUBSTRATES

GALLIUM NITRIDE BASED SEMICONDUCTOR LIGHT EMITTING DEVICE AND METHOD FOR MANUFACTURING THEREOF USING SURFACE MORPHOLOGY OF HOMOGENEOUS NITRIDE SUBSTRATES

机译:基于均相氮化物表面形态的基于氮化镓的半导体发光器件及其制造方法

摘要

The present invention relates to a nitride -based semiconductor light-emitting device and its manufacturing method . More specifically, the cladding layer and the physical properties of the substrate used to grow the gallium nitride to form the cladding layer of the semiconductor light emitting device using the same substrate , such as to form irregularities on the surface of the substrate , between the substrate and the semiconductor layer prior will reduce the total reflection of the photons in the photon scattering and boundary elements on the light emission efficiency is improved semiconductor light emitting device and a method of manufacturing the same .
机译:氮化物基半导体发光器件及其制造方法技术领域本发明涉及氮化物基半导体发光器件及其制造方法。更具体地,用于使氮化镓生长以使用相同的衬底来形成半导体发光器件的覆盖层的衬底的覆盖层和衬底的物理特性,例如在衬底之间在衬底的表面上形成凹凸。并且半导体层事先会减少光子在光子散射中的全反射和边界元素的发光效率,从而改善了半导体发光器件及其制造方法。

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