首页> 外国专利> DEVELOPMENT OF HIGHLY TRANSPARENT THERMALLY DECOMPOSED NITRIDE-BASED MULTI N-TYPE OHMIC CONTACT LAYER AND GROUP III NITRIDE LIGHT EMITTING DEVICES WITH THE SAME N-TYPE ELECTRODES

DEVELOPMENT OF HIGHLY TRANSPARENT THERMALLY DECOMPOSED NITRIDE-BASED MULTI N-TYPE OHMIC CONTACT LAYER AND GROUP III NITRIDE LIGHT EMITTING DEVICES WITH THE SAME N-TYPE ELECTRODES

机译:具有相同N型电极的高透明热分解氮化物基N型多羟基接触层和III族氮化物发光器件的开发

摘要

An optical device and its fabricating method are provided to enhance the ohmic contact characteristic at an interfacial surface of a n-type nitride-based cladding layer by employing a conductive thin film consisting of thermally decomposed nitride. A group-Ill nitride-based light emitting diode includes a substrate, an n-type nitride-based cladding layer(10) formed on the substrate, and a highly transparent multi-layered n-type schottky contact electrode structure formed on the n-type nitride-based cladding layer. A highly transparent multi-layered n-type schottky contact layer having at least one thermally decomposed nitride conductive layer is formed on the n-type nitride cladding layer. The thermally decomposed nitride conductive layer is made of nickel nitride, copper nitride, zinc nitride, indium nitride or tin nitride.
机译:提供一种光学装置及其制造方法,以通过使用由热分解的氮化物构成的导电薄膜来增强在n型氮化物基包层的界面处的欧姆接触特性。一种III族氮化物基发光二极管,包括:衬底;在该衬底上形成的n型氮化物覆层(10);以及在该n-型氮化物上形成的高度透明的多层n型肖特基接触电极结构。型氮化物基熔覆层。具有至少一个热分解的氮化物导电层的高度透明的多层n型肖特基接触层形成在n型氮化物覆层上。热分解的氮化物导电层由氮化镍,氮化铜,氮化锌,氮化铟或氮化锡制成。

著录项

  • 公开/公告号KR20070068537A

    专利类型

  • 公开/公告日2007-07-02

    原文格式PDF

  • 申请/专利权人 SAMSUNG ELECTRONICS CO. LTD.;

    申请/专利号KR20050130233

  • 发明设计人 SEONG TAE YEON;

    申请日2005-12-27

  • 分类号H01L21/318;H01L33/00;

  • 国家 KR

  • 入库时间 2022-08-21 20:34:18

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