首页> 外国专利> APPARATUS FOR FORMING TRANSITION METAL OXIDE MEMBRANE, METHOD FOR MANUFACTURING NONVOLATILE MEMORY DEVICE USING THE SAME, AND NONVOLATILE MEMORY DEVICE USING THIS METHOD

APPARATUS FOR FORMING TRANSITION METAL OXIDE MEMBRANE, METHOD FOR MANUFACTURING NONVOLATILE MEMORY DEVICE USING THE SAME, AND NONVOLATILE MEMORY DEVICE USING THIS METHOD

机译:形成过渡金属氧化物膜的设备,使用该方法制造非易失性存储器的方法以及使用该方法的非易失性存储器

摘要

An apparatus for forming a transition metal oxide layer, a method for manufacturing a nonvolatile memory device using the same, and a nonvolatile memory device manufactured by the same are provided to increase the density of a layer, to have the smoother surface of the layer, and to improve adhesive strength between the layer and a substrate by forming the transition metal oxide layer whose physical and electrical characteristics are improved on the substrate. A substrate(56) is installed in a chamber(51). A transition metal oxide layer(55) is formed on the substrate. A target(58) is installed in the chamber. Transition metal particles(M) that are a first source material of the transition metal oxide layer toward the substrate are discharged from the target. An oxygen ion beam gun(60) accelerates oxygen ions that are a second source material of the transition metal oxide layer to irradiates them toward the substrate. An argon ion beam gun(65) irradiates accelerated argon ions toward the target in order to excite a discharge of the transition metal particles from the target.
机译:提供用于形成过渡金属氧化物层的设备,使用其制造非易失性存储器件的方法以及由其制造的非易失性存储器件,以增加层的密度,以使层的表面更光滑,通过在基材上形成物理和电气特性得到改善的过渡金属氧化物层来提高层与基材之间的粘合强度。将基板(56)安装在腔室(51)中。在衬底上形成过渡金属氧化物层(55)。靶(58)安装在腔室内。从靶向靶排出作为过渡金属氧化物层的第一原料的过渡金属颗粒(M)。氧离子束枪(60)使作为过渡金属氧化物层的第二原料的氧离子加速而向基板照射。氩离子束枪(65)向靶辐射加速的氩离子,以激发过渡金属颗粒从靶的放电。

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