SUBSTRATE COATED WITH MULTIPLE RESISTS FOR FUNCTIONAL PATTERNS, AND METHOD OF MANUFACTURING FUNCTIONAL PATTERN SUBSTRATE USING THE SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor device, having patterns formed of photosensitive resists which is a combination of inkjet application process and photolithographic process that use a photomask, in order to reduce the number of processes and the resist consumption.;SOLUTION: A substrate coated with multiple resists for functional patterns and a method of manufacturing a functional pattern substrate using the substrate coated with multiple resists for functional patterns are provided. The substrate, coated with multiple resists for functional patterns, comprises multiple resist films having different functions. The multiple resist films are formed by applying desired multiple resist solutions for functional patterns, which have different functions, to their respective specified sections. The multiple resist solutions for functional patterns are used, when functional patterns are formed by means of a photolithographic process consisting of exposure processing for forming patterns on a resist-coated substrate and development processing for developing resist films, and the exposure processing is performed via a desired photomask having individual mask patterns for functional patterns, by using an exposure apparatus that forms patterns.;COPYRIGHT: (C)2008,JPO&INPIT