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RESIST UNDERCOAT FILM MATERIAL, AND RESIST UNDERCOAT FILM SUBSTRATE AND PATTERN FORMING METHOD USING THE SAME
RESIST UNDERCOAT FILM MATERIAL, AND RESIST UNDERCOAT FILM SUBSTRATE AND PATTERN FORMING METHOD USING THE SAME
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机译:抗蚀剂底膜材料,以及使用相同的抗蚀剂底膜基质和图案形成方法
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摘要
PROBLEM TO BE SOLVED: To provide a resist undercoat film material for a multilayer resist process, in particular, the material for a two-layer resist process or a three-layer resist process, which has the function to neutralize an amine-based contaminant from a substrate to reduce adverse effect such as a resist pattern footing on an overcoat resist.;SOLUTION: The resist undercoat film material for forming an undercoat of a chemically amplifying photoresist layer comprises a crosslinking polymer and a thermal acid generator expressed by general formula (1):A-(R1)4N+ that generates an acid by heating at 100°C or higher. A resist undercoat film substrate is provided, which has a resist undercoat film formed by using the resist undercoat film material.;COPYRIGHT: (C)2008,JPO&INPIT
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