RESIST UNDERCOAT FILM MATERIAL, AND RESIST UNDERCOAT FILM SUBSTRATE AND PATTERN FORMING METHOD USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a resist undercoat film material for a multilayer resist process, in particular, the material for a two-layer resist process or a three-layer resist process, which has the function to neutralize an amine-based contaminant from a substrate to reduce adverse effect such as a resist pattern footing on an overcoat resist.;SOLUTION: The resist undercoat film material for forming an undercoat film of a chemically amplifying photoresist layer comprises a crosslinking polymer and a thermal acid generator expressed by general formula (1a):R¹CF₂SO₃^-(R²)₄N⁺ which generates an acid by heating at 100°C or higher. A resist undercoat film substrate is provided which has a resist undercoat film formed by using the resist undercoat film material.;COPYRIGHT: (C)2008,JPO&INPIT