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WORKING DEVICE AND WORKING METHOD FOR MATERIAL USING UV RAY OR LIGHT AT SHORTER WAVELENGTH THAN UV RAY
WORKING DEVICE AND WORKING METHOD FOR MATERIAL USING UV RAY OR LIGHT AT SHORTER WAVELENGTH THAN UV RAY
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机译:使用比紫外线更短波长的紫外线或光的材料的工作装置和工作方法
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摘要
PROBLEM TO BE SOLVED: To provide a working device and a working method by which a shape whose working amount is different in each portion can be easily worked in one exposure.;SOLUTION: The device is equipped with an SR (synchrotron radiation) light source that emits x-rays of SR light, an X-ray mask 32 having a transmission portion in a predetermined shape that transmits the X-rays emitted from the SR light source, and an exposure stage that relatively moves the X-ray mask and a material and relatively vibrates the X-ray mask and the material so as to vibrate a region where the material is irradiated with the X-rays transmitting through a transmission aperture. The X-ray mask 32 has seven transmission apertures 103A to 103G, and all of the apertures are separated by concentric boundaries. When the X-ray mask 32 is moved in directions X and Y in an amplitude d, uneven density distribution is generated in the X-rays irradiating the material per unit time, which is used to work a three-dimensional shape having partially different working amounts in the one exposure.;COPYRIGHT: (C)2008,JPO&INPIT
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