With method and the equipment, and the lithography device or the measurement equipment which generate the radiation of the wave length range of approximately 30nm from approximately 1nm use

摘要

It is used for the lithography device or the measurement equipment by the discharge which was operated electrically, the wave length range the radiation of approximately 30nm (12) offers method and the equipment which it occurs from approximately 1nm. At least, one 1st electrode (14) and one which by the distance which is from the said 1st electrode is 2nd electrode (16) is used at least, the aforementioned electrode (14 and 16) one working medium (22) is offered between, at least. The working medium (22) among them the plasma occurs, occurrence radiation of the said plasma (12), because of further use, 1st opening (30) passing, advances, one aforementioned electrode (14 and 16) one territory (26) with, the fragment particle (28) occurs at least at least. In order the fragment particle (28) to keep, with particular method, at least the aforementioned territory (26), in order stretching to do outside the territory where fixed form it is done the aforementioned fragment particle (28) portable route (32) most, the aforementioned 1st opening (30) with at least, it is arranged the aforementioned 1st opening (30) vis-a-vis.