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Method for producing an electronic component, method for producing a thyristor, method for producing a drain-extended MOS filed-effect transistor, electronic component, drain-extended MOS field-effect transistor, electronic component arrangement
Method for producing an electronic component, method for producing a thyristor, method for producing a drain-extended MOS filed-effect transistor, electronic component, drain-extended MOS field-effect transistor, electronic component arrangement
In a method for producing an electronic component, a first doped connection region and a second doped connection region are formed on or above a substrate; a body region is formed between the first doped connection region and the second doped connection region; at least two gate regions separate from one another are formed on or above the body region; at least one partial region of the body region is doped by means of introducing dopant atoms, wherein the dopant atoms are introduced into the at least one partial region of the body region through at least one intermediate region formed between the at least two separate gate regions.
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