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INTEGRATED CIRCUIT STRUCTURES FOR INCREASING RESISTANCE TO SINGLE EVENT UPSET

机译:集成电路结构,可增加对单个事件的抵抗力

摘要

A configuration memory cell (“CRAM”) for a field programmable gate array (“FPGA”) integrated circuit (“IC”) device is given increased resistance to single event upset (“SEU”). A portion of the gate structure of the input node of the CRAM is increased in size relative to the nominal size of the remainder of the gate structure. Part of the enlarged gate structure is located capacitively adjacent to an N-well region of the IC, and another part is located capacitively adjacent to a P-well region of the IC. This arrangement gives the input node increased capacitance to resist SEU, regardless of the logical level of the input node. The invention is also applicable to any node of any type of memory cell for which increased resistance to SEU is desired.
机译:用于现场可编程门阵列(“ FPGA”)集成电路(“ IC”)器件的配置存储单元(“ CRAM”)具有增强的抗单事件翻转(“ SEU”)的能力。 CRAM的输入节点的一部分栅极结构的尺寸相对于其余栅极结构的标称尺寸有所增加。扩大的栅极结构的一部分与IC的N阱区域电容性地相邻,而另一部分与IC的P阱区域电容性地相邻。无论输入节点的逻辑电平如何,该布置都使输入节点具有增加的电容来抵抗SEU。本发明还适用于需要增加对SEU的抵抗力的任何类型的存储单元的任何节点。

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