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Laser-based irradiation apparatus and method to measure the functional dose-rate response of semiconductor devices

机译:基于激光的辐照设备和方法,用于测量半导体器件的功能剂量率响应

摘要

A broad-beam laser irradiation apparatus can measure the parametric or functional response of a semiconductor device to exposure to dose-rate equivalent infrared laser light. Comparisons of dose-rate response from before, during, and after accelerated aging of a device, or from periodic sampling of devices from fielded operational systems can determine if aging has affected the device's overall functionality. The dependence of these changes on equivalent dose-rate pulse intensity and/or duration can be measured with the apparatus. The synchronized introduction of external electrical transients into the device under test can be used to simulate the electrical effects of the surrounding circuitry's response to a radiation exposure while exposing the device to dose-rate equivalent infrared laser light.
机译:宽光束激光辐照设备可以测量半导体器件对剂量率等效红外激光曝光的参数或功能响应。比较设备加速老化之前,期间和之后的剂量率响应,或者从现场操作系统对设备进行定期采样,可以确定老化是否影响了设备的整体功能。这些变化对等效剂量率脉冲强度和/或持续时间的依赖性可以用该设备测量。将外部电瞬态同步引入被测设备可用于模拟周围电路对辐射的响应的电效应,同时将设备暴露于剂量率等效的红外激光下。

著录项

  • 公开/公告号US7375332B1

    专利类型

  • 公开/公告日2008-05-20

    原文格式PDF

  • 申请/专利权人 KEVIN M. HORN;

    申请/专利号US20060366289

  • 发明设计人 KEVIN M. HORN;

    申请日2006-03-02

  • 分类号G01R31/00;

  • 国家 US

  • 入库时间 2022-08-21 20:11:36

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