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Laser-based irradiation apparatus and methods for monitoring the dose-rate response of semiconductor devices

机译:基于激光的辐照设备和用于监视半导体器件的剂量率响应的方法

摘要

A scanned, pulsed, focused laser irradiation apparatus can measure and image the photocurrent collection resulting from a dose-rate equivalent exposure to infrared laser light across an entire silicon die. Comparisons of dose-rate response images or time-delay images from before, during, and after accelerated aging of a device, or from periodic sampling of devices from fielded operational systems allows precise identification of those specific age-affected circuit structures within a device that merit further quantitative analysis with targeted materials or electrical testing techniques. Another embodiment of the invention comprises a broad-beam, dose rate-equivalent exposure apparatus. The broad-beam laser irradiation apparatus can determine if aging has affected the device's overall functionality. This embodiment can be combined with the synchronized introduction of external electrical transients into a device under test to simulate the electrical effects of the surrounding circuitry's response to a radiation exposure.
机译:扫描的脉冲聚焦激光辐照设备可以测量和成像由于整个硅芯片上的剂量率等效曝光于红外激光而产生的光电流。比较设备加速老化之前,期间和之后的剂量率响应图像或时间延迟图像,或者通过现场操作系统对设备进行定期采样,可以精确识别设备中那些特定的受年龄影响的电路结构值得使用目标材料或电气测试技术进行进一步的定量分析。本发明的另一个实施例包括一个宽光束,等效剂量率的曝光设备。宽光束激光照射设备可以确定老化是否影响了设备的整体功能。该实施例可以与外部电瞬态的同步引入被测设备相结合,以模拟周围电路对辐射的响应的电效应。

著录项

  • 公开/公告号US7019311B1

    专利类型

  • 公开/公告日2006-03-28

    原文格式PDF

  • 申请/专利权人 KEVIN M. HORN;

    申请/专利号US20040810420

  • 发明设计人 KEVIN M. HORN;

    申请日2004-03-25

  • 分类号G01R31/28;

  • 国家 US

  • 入库时间 2022-08-21 21:41:39

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