ROTATORY CHUCK, UNIT FOR SUPPORTING A SUBSTRATE AND APPARATUS FOR PROCESSING THE SUBSTRATE

摘要

A rotary chuck, a substrate supporting unit, and a substrate processing apparatus are provided to enable the rotary chuck to maintain a substrate to be parallel to a stage by stably supporting a side portion of the substrate. A rotary chuck includes a rotary body(11) and a contact portion(13). The contact portion is connected to an end portion of the body. As the body rotates, a side portion of the substrate is received on a recess(15) of the contact portion, such that the substrate is supported. The body and the contact portion have different center axes in an extension direction. A diameter of the contact portion is smaller than that of the body. The recess has a round shape having a predetermined curvature.