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SUPPORTING STRUCTURE OF SUBSTRATE HOLDER FOR VERTICAL HEAT TREATMENT EQUIPMENT, VERTICAL HEAT TREATMENT EQUIPMENT, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
SUPPORTING STRUCTURE OF SUBSTRATE HOLDER FOR VERTICAL HEAT TREATMENT EQUIPMENT, VERTICAL HEAT TREATMENT EQUIPMENT, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
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机译:用于垂直热处理设备的基板支架的结构,垂直热处理设备以及制造半导体装置的方法
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摘要
PROBLEM TO BE SOLVED: To provide a supporting structure of a substrate holder for a vertical heat treatment equipment, and the vertical heat treatment equipment, in which the fall of the substrate holder can be prevented and the supporting structure is simple and the attachment and detachment operation of the substrate holder can be performed easily and safely.;SOLUTION: The supporting structure of the substrate holder for the vertical heat treatment equipment includes: a substrate holder 40 which has a bottom plate 42 and a first through-hole 45 provided in the bottom plate 42; a placement table 50 which has a top plate 51 and a second through-hole 56 provided in the top plate 51 corresponding to the first through-hole 45; and an insertion tool 70 which has a head 71 corresponding to the size of the first through-hole 45, and an axis part 72 corresponding to the size of the second through-hole 56. The supporting structure of the substrate holder for the vertical heat treatment equipment, and the vertical heat treatment equipment are characterized in that the substrate holder 40 is supported in the placement table 50 by the insertion tool 70 inserted into the first through-hole 45 and the second through-hole 56.;COPYRIGHT: (C)2009,JPO&INPIT
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