首页> 外国专利> SUPPORTING STRUCTURE OF SUBSTRATE HOLDER FOR VERTICAL HEAT TREATMENT EQUIPMENT, VERTICAL HEAT TREATMENT EQUIPMENT, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

SUPPORTING STRUCTURE OF SUBSTRATE HOLDER FOR VERTICAL HEAT TREATMENT EQUIPMENT, VERTICAL HEAT TREATMENT EQUIPMENT, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

机译:用于垂直热处理设备的基板支架的结构,垂直热处理设备以及制造半导体装置的方法

摘要

PROBLEM TO BE SOLVED: To provide a supporting structure of a substrate holder for a vertical heat treatment equipment, and the vertical heat treatment equipment, in which the fall of the substrate holder can be prevented and the supporting structure is simple and the attachment and detachment operation of the substrate holder can be performed easily and safely.;SOLUTION: The supporting structure of the substrate holder for the vertical heat treatment equipment includes: a substrate holder 40 which has a bottom plate 42 and a first through-hole 45 provided in the bottom plate 42; a placement table 50 which has a top plate 51 and a second through-hole 56 provided in the top plate 51 corresponding to the first through-hole 45; and an insertion tool 70 which has a head 71 corresponding to the size of the first through-hole 45, and an axis part 72 corresponding to the size of the second through-hole 56. The supporting structure of the substrate holder for the vertical heat treatment equipment, and the vertical heat treatment equipment are characterized in that the substrate holder 40 is supported in the placement table 50 by the insertion tool 70 inserted into the first through-hole 45 and the second through-hole 56.;COPYRIGHT: (C)2009,JPO&INPIT
机译:解决的问题:提供一种用于垂直热处理设备的基板支架的支撑结构以及该垂直热处理设备,其中可以防止基板支架的掉落并且该支撑结构简单并且可以进行装卸。解决方案:立式热处理设备的基板支架的支撑结构包括:基板支架40,其具有底板42和设置在基板上的第一通孔45。底板42;放置台50,其具有顶板51和设置在顶板51中的与第一通孔45对应的第二通孔56;插入工具70,其具有与第一通孔45的尺寸相对应的头部71和与第二通孔56的尺寸相对应的轴部72。垂直加热用基板支架的支撑结构处理设备和立式热处理设备的特征在于,基板保持器40通过插入到第一通孔45和第二通孔56中的插入工具70支撑在放置台50中。 )2009,日本特许厅

著录项

  • 公开/公告号JP2009212393A

    专利类型

  • 公开/公告日2009-09-17

    原文格式PDF

  • 申请/专利权人 MITSUMI ELECTRIC CO LTD;

    申请/专利号JP20080055456

  • 发明设计人 YAMAZAKI MITSUHARU;

    申请日2008-03-05

  • 分类号H01L21/683;H01L21/31;H01L21/324;H01L21/22;

  • 国家 JP

  • 入库时间 2022-08-21 19:45:18

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