首页> 外国专利> AUXILIARY HEAT-RETENTION JIG, ITS MANUFACTURING METHOD, WAFER BOAT WITH HEAT INSULATOR IN PLATE FORM, VERTICAL HEAT TREATMENT EQUIPMENT, METHOD FOR MODIFYING THE SAME AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

AUXILIARY HEAT-RETENTION JIG, ITS MANUFACTURING METHOD, WAFER BOAT WITH HEAT INSULATOR IN PLATE FORM, VERTICAL HEAT TREATMENT EQUIPMENT, METHOD FOR MODIFYING THE SAME AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

机译:辅助保温夹具,其制造方法,带有平板形式的绝热器的华夫船,垂直热处理设备,相同的修改方法和制造半导体装置的方法

摘要

PROBLEM TO BE SOLVED: To provide an auxiliary heat-retention jig necessary for modifying a fast thermal process system of medium temperature type into a fast thermal process system of high temperature type.;SOLUTION: The auxiliary heat-retention jig 1 is placed between a wafer boat 4 and a heat-retention jig 2. The auxiliary heat-retention jig 1 is provided with vertically arranged several heat insulators 7 in plate form. The heat insulators 7 are formed of opaque quartz.;COPYRIGHT: (C)2003,JPO
机译:解决的问题:提供一种必要的辅助保温夹具,以将中温类型的快速热处理系统更改为高温类型的快速热处理系统。解决方案:辅助保温夹具1位于晶片舟皿4和保温夹具2。辅助保温夹具1设置有沿竖直方向布置的多个板状绝热体7。绝热体7由不透明的石英形成。版权所有:(C)2003,日本特许厅

著录项

  • 公开/公告号JP2002343789A

    专利类型

  • 公开/公告日2002-11-29

    原文格式PDF

  • 申请/专利权人 MITSUBISHI ELECTRIC CORP;OMIYA KASEI KK;

    申请/专利号JP20010145956

  • 发明设计人 KATSURADA IKUO;MINAMI SHINJI;

    申请日2001-05-16

  • 分类号H01L21/31;F27D3/12;H01L21/324;H01L21/68;

  • 国家 JP

  • 入库时间 2022-08-22 00:13:13

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