首页> 外国专利> MASK FOR BLAST POLISHING AND METHOD OF MANUFACTURING SOLAR CELL PANEL

MASK FOR BLAST POLISHING AND METHOD OF MANUFACTURING SOLAR CELL PANEL

机译:太阳能电池板喷砂抛光面膜及制造方法

摘要

PROBLEM TO BE SOLVED: To provide a mask for blast polishing preventing damage to a solar-cell module by a thrust exerted by the mask for blast polishing when the mask for blast polishing is absorbed, and a method of manufacturing a solar cell panel.;SOLUTION: The mask (15) for blast polishing is a mask for blast polishing used when blast-polishing a substrate provided with a film. The mask (15) for blast polishing is provided with: a frame-shaped mask peripheral edge part (24) for protecting a peripheral edge part in a protection region protected from the blast polishing above the substrate (1); a cover part (21) covering above the protection region except for the peripheral edge part, and extending from the mask peripheral edge part so as to form space with respect to the substrate; an opening (33) for evacuation for evacuating the space surrounded by the substrate (1) and the cover part (21) and the mask peripheral edge part (24); and a thrust protector (14) disposed on an opposing surface in the cover part (21) opposed to the substrate.;COPYRIGHT: (C)2009,JPO&INPIT
机译:解决的问题:提供一种用于喷砂抛光的掩模,以防止在吸收用于喷砂抛光的掩模时,由喷砂抛光的掩模施加的推力对太阳能电池模块造成损坏,以及提供一种制造太阳能电池板的方法。 SOLUTION:喷砂抛光的掩模(15)是喷砂抛光带有薄膜的基材时使用的喷砂抛光的掩模。喷砂抛光用掩模(15)在框体(1)的上方设置有:框状的掩模周缘部(24),该框状的掩模周缘部(24)用于保护免受喷砂抛光的保护区域的周缘部。盖部(21),其覆盖所述保护区域的除了所述周缘部以外的部分,并且从所述掩模周缘部延伸以相对于所述基板形成空间。用于排空的开口(33)用于排空由基板(1)和盖部(21)以及掩模周缘部(24)围绕的空间。版权所有;(C)2009,日本特许经营&承接

著录项

  • 公开/公告号JP2009166203A

    专利类型

  • 公开/公告日2009-07-30

    原文格式PDF

  • 申请/专利权人 MITSUBISHI HEAVY IND LTD;

    申请/专利号JP20080009240

  • 发明设计人 OGAWA KAZUHIKO;INOUE MASASHI;

    申请日2008-01-18

  • 分类号B24C1/04;H01L31/04;

  • 国家 JP

  • 入库时间 2022-08-21 19:44:43

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