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INDIUM-ZINC-OXIDE-BASED SPUTTERING TARGET, MANUFACTURING METHOD THEREFOR, AND INDIUM-ZINC-OXIDE-BASED THIN FILM
INDIUM-ZINC-OXIDE-BASED SPUTTERING TARGET, MANUFACTURING METHOD THEREFOR, AND INDIUM-ZINC-OXIDE-BASED THIN FILM
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机译:基于铟锌氧化物的溅射靶材,制造方法以及基于铟锌氧化物的薄膜
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摘要
PROBLEM TO BE SOLVED: To provide an indium-zinc-oxide-based sputtering target; a manufacturing method therefor; and an indium-zinc-oxide-based thin film.;SOLUTION: The indium-zinc-oxide-based sputtering target has a composition expressed by (MO2)x(In2O3)y(ZnO)z, wherein x:y is 1:0.01 to 1:1; y:z is 1:0.1 to 1:10; and M is one or more metals selected from the group consisting of hafnium (Hf), zirconium (Zr) and titanium (Ti).;COPYRIGHT: (C)2009,JPO&INPIT
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机译:要解决的问题:提供一种基于铟锌氧化物的溅射靶;其制造方法;解决方案:铟锌氧化物溅射靶的组成表示为(MO 2 Sub>) x Sub>( In 2 Sub> O 3 Sub>) y Sub>(ZnO) z Sub>,其中x:y为1:0.01到1: 1; y:z为1:0.1至1:10; M是选自ha(Hf),锆(Zr)和钛(Ti)的一种或多种金属。版权所有:(C)2009,JPO&INPIT
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