SILVER ALLOY, SPUTTERING TARGET, REFLECTOR FOR REFLECTION LCD, REFLECTION WIRING ELECTRODE, THIN FILM, MANUFACTURING METHOD THEREFOR, OPTICAL RECORDING MEDIUM, ELECTRO MAGNETIC WAVE SHIELD, METAL MATERIAL FOR ELECTRONIC PART, WIRING MATERIAL, ELECTRONIC PART, ELECTRONIC APPLIANCE, PROCESSING METHOD OF METAL FILM, ELECTRON OPTICAL PART, LAMINATE, AND GLASS OF BUILDING MATERIAL

摘要

PROBLEM TO BE SOLVED: To provide a silver alloy having characteristics of superior corrosion resistance, high reflectance, low electric resistance and superior heat resistance, and to provide a sputtering target.;SOLUTION: The silver alloy superior in corrosion resistance includes Ag as a main component, and at least one element selected from the group composed of Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Fe, Ru, Co, Rh, Ir, Ni, Pd, Pt, Cu, Au, Zn, Al, Ga, In, Si, Ge and Sn. The content of at least one each element described above is preferably 0.1 atom% or more but 8.0 atom% or less. The sputtering target is comprised of the silver alloy. The sputtering target can be used for manufacturing a reflector for a reflection LCD or a reflection wiring electrode, which controls the yellowing of reflected light.;COPYRIGHT: (C)2004,JPO