首页> 外国专利> METHOD OF MANUFACTURING TRANSLUCENT ELECTROMAGNETIC WAVE SHIELDING FILM AND TRANSLUCENT ELECTROMAGNETIC WAVE SHIELDING FILM

METHOD OF MANUFACTURING TRANSLUCENT ELECTROMAGNETIC WAVE SHIELDING FILM AND TRANSLUCENT ELECTROMAGNETIC WAVE SHIELDING FILM

机译:制造半透明电磁波屏蔽膜和半透明电磁波屏蔽膜的方法

摘要

PPROBLEM TO BE SOLVED: To provide a translucent electromagnetic wave shielding film that forms a thin line pattern of an electromagnetic wave shielding material exhibiting high EMI shieldability and high transparency simultaneously, and can be employed in inexpensive mass production of translucent electromagnetic wave shielding film. PSOLUTION: In a translucent electromagnetic wave shielding film having a conductive metal portion and a light transmissive portion, a silver halide containing layer containing a silver halide and a binder is exposed as a photosensor provided on a plastic film, a metal silver portion and a light transmissive portion (the light transmissive portion has substantially no nucleus of physical development) are formed by carrying out development and fixing, a conductive metal portion carrying conductive metal particles at the metal silver portion is also formed by carrying out physical development and/or plating of the metal silver portion, wherein the silver halide is doped with rhodium ions or iridium ions, its an average grain size is 0.1-1,000 nm, its development is carried out using developer containing an image quality improvement agent, a gradation after development exceeds 4.0, a surface resistance of a light transmissive electromagnetic wave shield shielding film is 2.5 /sq or less after physical development and/or plating, and the line width of the conductive metal portion is 20 m or less. PCOPYRIGHT: (C)2009,JPO&INPIT
机译:

要解决的问题:提供一种半透明电磁波屏蔽膜,该半透明电磁波屏蔽膜形成同时显示出高EMI屏蔽性和高透明性的电磁波屏蔽材料的细线图案,并且可以用于廉价的批量生产的半透明电磁波屏蔽中电影。

解决方案:在具有导电金属部分和透光部分的半透明电磁波屏蔽膜中,将包含卤化银和粘合剂的卤化银含有层作为光敏元件暴露在塑料膜上,金属银部分被暴露并且通过显影和固定形成透光部分(透光部分基本上没有物理显影核),并且还通过进行物理显影和/或形成在金属银部分带有导电金属颗粒的导电金属部分。或电镀金属银部分,其中卤化银掺杂有铑离子或铱离子,其平均粒径为0.1-1,000 nm,其显影使用含有图像质量改进剂的显影剂进行,显影后为灰度超过4.0时,透光性电磁波屏蔽屏蔽膜的表面电阻为2.5 / sq以下在物理显影和/或电镀之后,导电金属部分的线宽为20m或更小。

版权:(C)2009,日本特许厅&INPIT

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