首页> 外国专利> METHOD FOR CRYSTALLIZING POLYSILICON, METHOD FOR FABRICATING POLYSILICON THIN FILM TRANSISTOR USING THE SAME, AND METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY

METHOD FOR CRYSTALLIZING POLYSILICON, METHOD FOR FABRICATING POLYSILICON THIN FILM TRANSISTOR USING THE SAME, AND METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY

机译:结晶多晶硅的方法,使用相同的方法制造多晶硅薄膜晶体管的方法以及制造液晶显示器的方法

摘要

A polysilicon layer (23) is formed on a substrate (20). The grains of the polysilicon layer except the grains having specific orientation are made amorphous, and the polysilicon layer is crystallized using the grains having the specific orientation. Independent claims are also included for the following: (1) fabrication of polysilicon thin film transistor; and (2) fabrication of liquid crystal display.
机译:在衬底(20)上形成多晶硅层(23)。使除具有特定取向的晶粒之外的多晶硅层的晶粒为非晶态,并且使用具有特定取向的晶粒使多晶硅层结晶。还包括以下方面的独立权利要求:(1)制造多晶硅薄膜晶体管; (2)液晶显示器的制造。

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