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Magnet system, magnetron spatter device and magnetron spatter method for magnetron spatter
Magnet system, magnetron spatter device and magnetron spatter method for magnetron spatter
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机译:磁控系统,磁控溅射装置及磁控溅射的磁控溅射方法
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摘要
The magnet system for magnetron spatter of this invention when it is opposed to the target being the magnet system for portable possible magnetron spatter in abbreviation parallel direction vis-a-vis the suffering spatter aspect of the aforementioned target, in abbreviation vertical direction extending being present and N extremely or inside the S pole is opposed in the aforementioned target, alienating from the magnet and the magnet inside the description above vis-a-vis the direction of the aforementioned movement, surrounds the magnet inside the description above, outside the pole of opposite to the magnet inside the description above is opposed in the aforementioned target, is provided the magnet and with of the magnet inside the description above and the magnet, outside the description above keeping the magnet inside the description above and the magnet outside the description aboveIt features that reversal possibly it is provided the nonmagnetic component which it does and, it has, the pole which opposes to the aforementioned target the magnet inside the description above and the magnet outside the description above in respectively. Controlling the variation of the electron density in the edge of the target, it can assure the equalization of plasma density of the part of that. Because of this, equalization of the spatter rate in the target edge assures, can control the variation of membrane distribution to membrane object ones. In addition, making also the variation of the target erosion small, utilization efficiency of the target it can improve.
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