Magnetron spatter device and magnetron spatter method

摘要

As for the magnetron spatter device of this invention, opposing to the target outside the gas inlet and the spatter room which facing to the opposition arrangement possible spatter room and the spatter room, can provide the target and membrane object ones as it is provided, vis-a-vis the center it makes the voltage impression to the target start lap in while turning of the sensor and the magnet which detect lap the direction position inside the surface of revolution of the magnet and the magnet which the position where eccentricity it does on the rotary center revolution possibly are provided on the basis of the gas pressure distribution of direction position and the spatter interior, it has with the control control equipment which makes discharge the spatter interior cause.