首页> 外国专利> METHOD OF FORMING NANO DOT, METHOD OF FABRICATING MEMORY DEVICE INCLUDING NANO DOT, CHARGE TRAP LAYER INCLUDING NANO DOT, AND MEMORY DEVICE INCLUDING IT

METHOD OF FORMING NANO DOT, METHOD OF FABRICATING MEMORY DEVICE INCLUDING NANO DOT, CHARGE TRAP LAYER INCLUDING NANO DOT, AND MEMORY DEVICE INCLUDING IT

机译:形成纳米点的方法,制造包括纳米点的存储器的方法,包括纳米点的电荷陷阱层以及包括它的存储器

摘要

PPROBLEM TO BE SOLVED: To provide: a method of forming nano dots; a method of fabricating a memory device including the nano dots; a charge trap layer including the nano dots; and a memory device including the charge trap. PSOLUTION: The method of forming the nano dots include a first step for forming cores, a second step for coating the surfaces of the cores with a polymer, and a third step for forming graphene layers covering the surfaces of the cores by thermally treating the cores coated with the polymer. The cores may be removed after the third step. The surfaces of the cores may be coated with a graphitization catalyst material before coating the surfaces of the cores with the polymer. Also, the cores contain a charge trap and metal particles having a function as a graphitization catalyst, or may contain metal particles having a charge trapping function. PCOPYRIGHT: (C)2009,JPO&INPIT
机译:

要解决的问题:提供:一种形成纳米点的方法;一种制造包括纳米点的存储器件的方法;包括纳米点的电荷陷阱层;包括电荷陷阱的存储装置。

解决方案:形成纳米点的方法包括第一步,形成核,第二步,用聚合物涂覆核的表面,第三步,通过热形成覆盖核表面的石墨烯层。处理涂覆有聚合物的芯。第三步后可以将芯子取出。在用聚合物涂覆核的表面之前,可以用石墨化催化剂材料涂覆核的表面。而且,芯包含电荷陷阱和具有充当石墨化催化剂功能的金属颗粒,或者可以包含具有电荷陷阱功能的金属颗粒。

版权:(C)2009,日本特许厅&INPIT

著录项

  • 公开/公告号JP2009099982A

    专利类型

  • 公开/公告日2009-05-07

    原文格式PDF

  • 申请/专利权人 SAMSUNG ELECTRONICS CO LTD;

    申请/专利号JP20080262228

  • 申请日2008-10-08

  • 分类号H01L21/8247;H01L29/788;H01L29/792;H01L27/115;

  • 国家 JP

  • 入库时间 2022-08-21 19:39:31

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号