首页> 外国专利> The PLZT or PZT ferroelectric thin film, the constituent and formation manner null for that formation

The PLZT or PZT ferroelectric thin film, the constituent and formation manner null for that formation

机译:PLZT或PZT铁电薄膜,其形成和形成方式对该形成无效

摘要

PROBLEM TO BE SOLVED: To lower a crystallization temperature of a PLZT(Pb, La, Zr, Ti) ferroelectric thin film. SOLUTION: Concerning a ferroelectric-thin-film forming composition that is made of an organic metal compound solution for forming a PLZT ferroelectric thin film, a liquid composition is prepared to form a thin film of a blended composite metal oxide consisting of a composite metal compound A that is expressed by the formula: (Pbx Lay )(Zrz Ti1-z )O3 (wherein 0.9x1.3, 0=y0.1, 00.9); and a composite metal oxide B that is composed of one kind or two/more kinds of elements selected from Bi, Si, Pb, Ge, Sn, Al, Ga, In, Mg, Ca, Sr, Ba, V, Nb, Ta, Sc, Y, Ti, Zr, Hf, Cr, Mn, Fe, Co, Ni, Zn, Cd, Li, Na, and K. This liquid composition is used to form a film by a chemical- solution-deposition(CSD) method such as a sol-gel method, and thus a ferroelectric thin film fired at a low temperature of about 400 deg.C can be obtained.
机译:解决的问题:降低PLZT(Pb,La,Zr,Ti)铁电薄膜的结晶温度。解决方案:关于由用于形成PLZT铁电薄膜的有机金属化合物溶液制成的铁电薄膜形成组合物,要制备液体组合物以形成由复合金属化合物组成的混合复合金属氧化物的薄膜A由下式表示:(Pbx Lay)(Zrz Ti1-z)O3(其中0.9

著录项

  • 公开/公告号JP4329287B2

    专利类型

  • 公开/公告日2009-09-09

    原文格式PDF

  • 申请/专利权人 三菱マテリアル株式会社;

    申请/专利号JP20010263378

  • 发明设计人 曽山 信幸;永峯 薫;牧 一誠;

    申请日2001-08-31

  • 分类号C01G25/00;H01L21/316;H01L21/8246;H01L27/105;

  • 国家 JP

  • 入库时间 2022-08-21 19:39:00

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号