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Stress and phase transformations in PZT thin films.

机译:PZT薄膜中的应力和相变。

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摘要

Thin films of ferroelectric materials such as lead zirconate titanate, Pb(ZrxTi1−x)O3 or PZT, have a variety of applications in sensors, actuators and non-volatile memory devices. While bulk ferroelectric materials have been investigated extensively in the past, the differences that exist between thin film and bulk PZT can significantly affect the structural and electrical properties of PZT capacitors.; We have investigated the effects of film stress and thickness on the structural and electrical properties of nominally tetragonal Pb(Zr0.35 Ti0.65)O3 films ranging in thickness from 700Å to 4000Å grown by metalorganic chemical vapor deposition. Using high-resolution x-ray diffraction, electron backscatter diffraction and electrical measurements, we have observed that as-deposited PZT films of 1000Å and less are rhombohedral, while the thicker films are partially tetragonal and partially rhombohedral. X-ray depth profiling was used to show that the thicker as-deposited PZT films have a layered structure, with tetragonal PZT near the surface and rhombohedral PZT near the substrate interface. The origin of the rhombohedral phase in the nominally tetragonal PZT can be explained by considering the effect of substrate constraint on PZT grains that contain a single ferroelastic domain. Wafer curvature and x-ray diffraction stress measurements were used to show that the observed structure of PZT films is consistent with the theoretically predicted stress-induced phase transformation from the equilibrium tetragonal into the rhombohedral phase. The observed thickness-dependent structural evolution affects the electrical properties of the PZT films. Annealing the films changes the relative volume fractions of the rhombohedral and tetragonal phases and the ferroelectric and dielectric properties of the PZT capacitors.; We have also used a wafer bending method to investigate the effect of applied mechanical strain on the ferroelectric and dielectric properties of PZT capacitors. It was observed that even small biaxial strains can affect the electrical properties of PZT, significantly decreasing the remanent polarization and increasing the dielectric constant of PZT capacitors. These observations are consistent with the accommodation of imposed strain by reversible 90° domain wall motion that changes the volume fraction of domains that switch during electrical testing.
机译:诸如锆钛酸铅,Pb(Zr x Ti 1-x )O 3 或PZT之类的铁电材料薄膜具有多种在传感器,执行器和非易失性存储设备中的应用。尽管过去已经对块状铁电材料进行了广泛的研究,但薄膜和块状PZT之间存在的差异会显着影响PZT电容器的结构和电性能。我们已经研究了薄膜应力和厚度对标称四方Pb(Zr 0.35 Ti 0.65 )O3薄膜的结构和电学性能的影响,该薄膜的厚度范围为700Å至4000Å通过金属有机化学气相沉积。使用高分辨率的X射线衍射,电子背散射衍射和电学测量,我们观察到沉积的1000Å及以下的PZT膜是菱形的,而较厚的膜则是部分四方的和部分菱形的。 X射线深度剖析用于显示较厚的沉积PZT膜具有层状结构,表面附近为四边形PZT,衬底界面附近为菱形PZT。可以通过考虑基底约束对包含单个铁弹性域的PZT晶粒的影响来解释名义上为四方PZT的菱面体相的起源。晶圆曲率和X射线衍射应力测量结果表明,观察到的PZT膜结构与理论上预测的应力诱导的相变(从平衡四方相转变为菱面体相)一致。观察到的厚度依赖性结构演变影响了PZT薄膜的电性能。薄膜退火会改变菱形和四方相的相对体积分数以及PZT电容器的铁电和介电特性。我们还使用晶片弯曲方法来研究施加的机械应变对PZT电容器铁电和介电性能的影响。据观察,即使很小的双轴应变也会影响PZT的电性能,从而显着降低剩余极化并增加PZT电容器的介电常数。这些观察结果与可逆的90°畴壁运动对施加的应变的调节相一致,该运动改变了在电测试过程中切换的畴的体积分数。

著录项

  • 作者

    Kelman, Maxim B.;

  • 作者单位

    Stanford University.;

  • 授予单位 Stanford University.;
  • 学科 Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 2003
  • 页码 168 p.
  • 总页数 168
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;
  • 关键词

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