Production method of pirensuruhononiumu salt chemical compound and the said chemical compound, the photosensitive resin composition which uses the said chemical compound and the photosensitive material which uses this.

摘要

PPROBLEM TO BE SOLVED: To solve problems that a highly sensitive photoacid generator compound is demanded in a photosensitive resin composition exhibiting a spectral sensitivity to light at 365 nm and to provide a pyrenesulfonic acid onium salt compound. PSOLUTION: The pyrenesulfonic acid onium salt compound having a plurality of sulfonic acid onium salt moieties is used as the photoacid generator in a photosensitive material basically comprising a polymer increasing the solubility in an aqueous solution of an alkali by actions of an acid and the photoacid generator. Thereby, the photosensitive material exhibiting a positive type behavior with a good sensitivity can be provided. PCOPYRIGHT: (C)2003,JPO