首页> 外国专利> Production manner of suruhononiumu salt chemical compound and the said chemical compound, the photosensitive resin constituent and the photosensitive material null below-mentioned general expression which

Production manner of suruhononiumu salt chemical compound and the said chemical compound, the photosensitive resin constituent and the photosensitive material null below-mentioned general expression which

机译:suruhononiumu盐化合物和所述化合物,光敏树脂成分和光敏材料的生产方式如下所述,其通式为

摘要

PROBLEM TO BE SOLVED: To provide a photo acid generator compound exhibiting high spectral sensitivity to near ultraviolet light, to provide a method for producing the compound, to provide a photosensitive resin composition using the compound, and to provide a photosensitive material.;SOLUTION: This onium sulfonate compounds represented by general formula (1) and general formula (4). The method for producing the compound. Further, a photosensitive resin composition using the same, and a photosensitive material using the photosensitive resin composition using the same.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:解决的问题:提供对近紫外光具有高光谱敏感性的光产酸剂化合物,提供制备该化合物的方法,提供使用该化合物的光敏树脂组合物,并提供光敏材料。该通式(1)和通式(4)表示的磺酸盐化合物。该化合物的生产方法。此外,使用该组合物的光敏树脂组合物和使用该光敏树脂组合物的光敏材料。版权所有:(C)2005,JPO&NCIPI

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