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METHOD AND APPARATUS FOR MODELING A VECTORIAL POLARIZATION EFFECT IN AN OPTICAL LITHOGRAPHY SYSTEM
METHOD AND APPARATUS FOR MODELING A VECTORIAL POLARIZATION EFFECT IN AN OPTICAL LITHOGRAPHY SYSTEM
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机译:在光学光刻系统中建模矢量极化效应的方法和装置
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摘要
One embodiment of the present invention provides a system that accurately models polarization effects in an optical lithography system for manufacturing integrated circuits. During operation, the system starts by receiving a polarization-description grid map for a lens pupil in the optical lithography system. The system then constructs a pupil-polarization model by defining a vectorial matrix at each grid point in the grid map, wherein the vectorial matrix specifies a pupil-induced polarization effect on an incoming optical field at the grid point. Next, the system enhances a lithography model for the optical lithography system by incorporating the pupil-polarization model into the lithography/OPC model. The system then uses the enhanced lithography model to perform convolutions with circuit patterns on a mask in order to simulate optical lithography pattern printing.
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