SUBSTRATE HANDLING SYSTEM OF A LITHOGRAPHY APPARATUS AND METHOD THEREOF

摘要

A substrate handling system comprising a substrate holder comprising a main body with a main body surface, and a plurnlity of burls projecting from the main hody surface to support the substrate spaced apart from the main body surface, clamping means, the clamping means being configured to clamp and/or unclamp the substrate onto the substrate holder, and conveying means, the conveying means being configured to load and/or unload the suhsirate onto the substrate holder, wherein the conveying means is further configured to physically contact the substrate during the clamping and/or unclamping to the substrate holder. It is also described methods for elamping and unclamping a substrate, a computer program, a computer-readable medium and a lithography apparatus.