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CMOS EPROM AND EEPROM DEVICES AND PROGRAMMABLE CMOS INVERTERS

机译:CMOS EPROM和EEPROM器件以及可编程CMOS反相器

摘要

A CMOS EPROM, EEPROM or inverter device includes an nFET device with a thin gate dielectric layer and a pFET device juxtaposed with the nFET device with a thick gate dielectric layer and a floating gate electrode. The thick gate dielectric layer is substantially thicker than the thin gate dielectric layer. A common drain node connected both FET devices has no external connection in the case of a memory device and has an external connection in the case of an inverter. There are external circuit connections to the source regions of both FET devices and to the gate electrode of the nFET device. The pFET and nFET devices can be planar, vertical or FinFET devices.
机译:CMOS EPROM,EEPROM或反相器装置包括具有薄的栅极介电层的nFET装置以及与具有厚的栅极介电层和浮置栅电极的nFET装置并置的pFET装置。厚的栅极电介质层实质上比薄的栅极电介质层厚。连接两个FET器件的公共漏极节点在存储器件的情况下没有外部连接,而在反相器的情况下具有外部连接。外部电路连接到两个FET器件的源极区域和nFET器件的栅电极。 pFET和nFET器件可以是平面,垂直或FinFET器件。

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