Method for making a thin-film poly-crystalline silicon solar cell on an indium tin oxide-glass substrate at a low temperature

摘要

A method is disclosed for making a thin-film poly-crystalline silicon solar cell. In the method, there is provided an ITO-glass substrate by coating a glass substrate with a transparent and conductive ITO film. An amorphous silicon film is grown on the ITO-glass substrate. An aluminum film is grown on the amorphous silicon film. The aluminum film and the amorphous silicon film arte annealed and therefore converted into an aluminum-silicon alloy film and a p⁺ poly-crystalline silicon film, respectively. In a low-temperature plasma-based deposition process, a p⁻ poly-crystalline silicon film is coated on the p⁺ poly-crystalline silicon film, and an n⁺ poly-crystalline silicon film is coated on the p⁻ poly-crystalline silicon film. An ohm contact is provided on the transparent and conductive ITO film. Other ohm contacts are provided on the n⁺ poly-crystalline silicon film. An anti-reflection film is coated on the n⁺ poly-crystalline silicon film.