VACUUM PROCESSING CHAMBER SUITABLE FOR ETCHING HIGH ASPECT RATIO FEATURES AND COMPONENTS OF SAME

摘要

Embodiments of the invention provide a method and apparatus, such as a processing chamber, suitable for etching high aspect ratio features. Other embodiments include a showerhead assembly (130) for use in the processing chamber (100). In one embodiment, a processing chamber (100) includes a chamber body (102) having a showerhead assembly (130) and substrate support (148) disposed therein. The showerhead assembly (130) includes at least two fluidly isolated plenums, a region transmissive to an optical metrology (140) signal, and a plurality of gas passages (242) formed through the showerhead assembly fluidly coupling the plenums to the interio volume of the chamber body.