METHOD FOR PLASMA-ASSISTED VAPOUR-PHASE CHEMICAL DEPOSITION OF A CARBON/METAL FILM

摘要

The invention relates to a composite film including carbon and at least one metal, which is deposited by means of plasma-assisted vapour-phase chemical deposition using at least one chemical solution containing a solid or liquid metal precursor dissolved in at least one solvent forming a carbon source. In addition, the plasma is generated at a frequency of between 2OkHz and 50OkHz and preferably between 40 kHz and 440 kHz.