Field Emission from Boron Carbon Nitride Films Synthesized by Plasma-Assisted Chemical Vapor Deposition

摘要

Boroncarbonnitride (BCN) films are synthesized by plasma-assisted chemical vapor deposition. Borontrichloride (BCl_3), methane (CH_4) and nitrogen (N_2) are used as source gases. It is revealed from transmission electron microscopic observation that BCN films consist of crystal grains, the size of which is about 3 nm. Existence of B-N, B-C and C-N bonds are detected by x-ray photoelectron spectroscopy. Electron emission is detected at an electric field as low as 11 V/μm for the BCN film deposited on n-Si substrate. It is also demonstrated that the cathode metal contacted to BCN films has an influence on field emission characteristics.