METHOD OF FABRICATING A SPUTTERING TARGET OF MOLYBDENUM HAVING ULTRAFINE CRYSTALLINE AND SPUTTERING TARGET OF MOLYBDENUM PREPARED THEREBY

摘要

The invention nanocrystalline Mo manufacturing method of a sputtering target , and thus relates to a sputtering target obtained Mo more particularly, during a sputtering target manufacturing by using the Mo powder as a raw material of nano-sized powders , nanocrystalline performing a two-stage sintering process over a long period of time in a short period of time at a high temperature and a low temperature method of manufacturing a sputtering target of Mo , and thus relates to a sputtering target obtained Mo . ; the method allows the production of a sputtering target having an ultra-fine crystal grains of 500 nm or less to suppress the rapid grain growth occurring during sintering nanopowder .