HEAT TREATING SETTER FOR GLASS SUBSTRATE, MANUFACTURING METHOD THEREOF, AND HEAT TREATMENT METHOD FOR GLASS SUBSTRATE

摘要

A heat treatment placement person for a glass substrate and its manufacturing method is arranged to realize uses placement person several times after the surface for polishing it. A heat treatment placement person for a glass substrate represents the mechanism of the sintering of a sheet pottery. Placement person uses the subsequently heat-treated glass substrate of glass substrate on it. Be heat-treated placement person 20-600 degrees Celsius at a temperature of with 7 degrees Celsius of thermal expansion coefficient placement persons of 0-10x10 with a 3D network structure open-pore. The air transmittance of placement person is 0.5-10x10-3cm^2. The surface brightness of placement person is 0.1-20mum. The mechanism of the sintering of the one petalite pottery of authority representative of the sintering of pottery.