SYSTEM FOR CLEANING A SEMICONDUCTOR DEVICE, CAPABLE OF PREVENTING THE INFERIORITY OF FOCUS AT A FLOWING PROCESS DUE TO CONTAMINANT

摘要

PURPOSE: A system for cleaning a semiconductor device is provided to reduce a processing time by configuring a chamber for a wafer cleaning process.;CONSTITUTION: In a system for cleaning a semiconductor device, a photo process apparatus(200) includes a scanner(240), a coater(230), an evaporator(220), and a cleaner(260). The scanner projects beam to a wafer and forms a certain pattern, and the coater coats a wafer. The evaporator deposits the material injected into a wafer, and the cleaner unifies the scanner, the coater, and the evaporator into one track. The cleaner washes the foreign material on the wafer by using air bubbles.;COPYRIGHT KIPO 2010