PLASMA PROCESS APPARATUS, COMPONENT WITHIN THE CHAMBER AND METHOD FOR DETECTING THE LIFE OF THE SAME

摘要

PURPOSE: A plasma processing apparatus is provided to prevent waste due to replacement of a part which is not old. CONSTITUTION: A plasma processing apparatus includes a plurality of parts inside a chamber. A chemical element layer(51,52,53) for detecting lifetime made of element different from the parts inside the chamber is formed in the parts inside the chamber. The chemical element layer for detecting lifetime is formed in a position corresponding to a worn surface of the parts inside the chamber, and is formed in a depth corresponding to a maximum value of allowable worn thickness of the parts inside the chamber.