Vapor deposition device, an apparatus for controlling a vapor deposition device, method for controlling a vapor deposition device, a process for the use of a vapor deposition device and method for producing a blowing output

摘要

Vapor deposition device, comprising: a vapor deposition source for the vaporization of a film-forming, which is a starting material for a film formation is; a transport path, which with the vapor deposition source is connected via a connecting path, for transporting of the film-forming, the of the vapor deposition source is evaporated; a sand-blasting tank with a blowing output, which is connected with the transport path, for blowing out of the film-forming, which is transported by the transport path, from the blast pipe output; and a process chamber for carrying out of the film formation on a target object with the blown-out film forming material selected,the sand-blasting tank a buffer chamber therein and the film forming material selected from the blast pipe output out, after the film forming material selected by the buffer chamber pass, so that a pressure in the buffer space of the blow container is higher than a pressure container, outside the blast pipe.