Vapor deposition device, an apparatus for controlling of the vapor deposition device, method for controlling the vapor deposition device and method for the use of the vapor deposition device

摘要

Vapor deposition device for performing a film formation on a target object by vapour deposition, wherein the device comprises:a vapor deposition source for the vaporization of a film-forming, which is a starting material for the film formation is;a blowing mechanism which, with the vapor deposition source is connected by a connecting path, for blowing out of the film-forming, the of the vapor deposition source is evaporated;a first process chamber, the mechanism therein, the blast pipe, for carrying out of the film formation on the target object therein with the film forming material selected, the mechanism is blown out from the blast pipe;a second process chamber, the separated from the first process chamber is installed, for receiving the vapor deposition source therein; andan outlet valve mechanism, which is connected with the first process chamber, to evacuate the interior of the first process chamber to a predetermined vacuum level.