PLASMA PROCESSING METHOD, PLASMA PROCESSING APPARATUS, AND MOISTURE CONTENT DETECTING METHOD OF PLASMA PROCESSING APPARATUS

摘要

PROBLEM TO BE SOLVED: To detect a moisture content in a processing chamber without using a mass spectrometer such as a quadrupole type mass spectrometer (Qmass).;SOLUTION: A plasma processing method includes a step of reducing the pressure in the processing chamber 110 and introducing a prescribed gas while evacuating the processing chamber, and exciting the gas to a plasma, a step of acquiring light emission intensity by receiving light in a specified wavelength range correlative to the moisture content in the processing chamber in a light emission spectrum of the plasma transmitted through a window portion 200 for monitoring provided to the processing chamber, and a step of detecting change in moisture content in the processing chamber on the basis of the light emission intensity.;COPYRIGHT: (C)2010,JPO&INPIT