首页> 外国专利> COUPLING LAYER COMPOSITION FOR A SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE, METHOD OF FORMING THE COUPLING LAYER, AND APPARATUS FOR THE MANUFACTURE OF A SEMICONDUCTOR DEVICE

COUPLING LAYER COMPOSITION FOR A SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE, METHOD OF FORMING THE COUPLING LAYER, AND APPARATUS FOR THE MANUFACTURE OF A SEMICONDUCTOR DEVICE

机译:用于半导体器件的耦合层组成,半导体器件,形成耦合层的方法以及用于制造半导体器件的装置

摘要

Molecules of a coupling layer composition in a semiconductor device are bidimensionally polymerized in order to provide enhanced moisture blocking effect, particularly when the coupling layer is formed on a porous layer, such as a porous dielectric layer. The deposition of the coupling layer on the underlying structure and/or the cross-polymerization of the coupling layer composition and/or a final metallization can be photo-activated, especially, but not only, using an ultraviolet light.
机译:半导体器件中的耦合层组合物的分子被二维聚合以提供增强的水分阻挡效果,特别是当耦合层形成在诸如多孔介电层的多孔层上时。偶联层在下面的结构上的沉积和/或偶联层组合物的交联和/或最终的金属镀层可以被光活化,特别是但不仅限于使用紫外线。

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