Visibility and Transport Kernels for Variable Etch Bias Modeling of Optical Lithography

摘要

Kernels that model characteristics of the etching portion of an optical lithographic model are provided. In various implementations, a visibility density kernel is provided. The visibility density kernel approximates the area of the simulated substrate that is “visible” to the etchant. With various implementations, a transport kernel is provided. The transport kernel approximates the convective “movement” of etchant.