首页> 外国专利> Sensor for measuring liquid contaminants in a semiconductor wafer fabrication process

Sensor for measuring liquid contaminants in a semiconductor wafer fabrication process

机译:用于测量半导体晶圆制造过程中液体污染物的传感器

摘要

Liquid detection sensors are attached to both sides of a robotic arm end effector of a semiconductor wafer process system. The sensor mechanism or probe is situated on the front side and backside of the end effector, designed with electrical lines that are traced onto a polyester base material. The electrical lines are positioned in a serpentine formation. The high conductance of the sulfuric acid in the copper sulfate solution acts as the conductor between the traced lines. When the conductive liquid comes in contact with the traced lines, the lines short and the sensor activates or turns on.
机译:液体检测传感器附接到半导体晶片处理系统的机械臂末端执行器的两侧。传感器机构或探针位于末端执行器的前侧和后侧,并设计有可追踪到聚酯基材上的电线。电线呈蛇形排列。硫酸铜溶液中硫酸的高电导率充当描线之间的导体。当导电液体与走线接触时,这些线会短路,并且传感器会激活或打开。

著录项

  • 公开/公告号US7696538B2

    专利类型

  • 公开/公告日2010-04-13

    原文格式PDF

  • 申请/专利权人 WON LEE;EVAN E PATTON;

    申请/专利号US20060371650

  • 发明设计人 WON LEE;EVAN E PATTON;

    申请日2006-03-09

  • 分类号H01L29/84;

  • 国家 US

  • 入库时间 2022-08-21 18:50:37

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号