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Copper (II) complexes for deposition of copper films by atomic layer deposition
Copper (II) complexes for deposition of copper films by atomic layer deposition
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机译:用于通过原子层沉积法沉积铜膜的铜(II)配合物
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摘要
The present invention relates to novel 1,3-diimines and 1,3-diimine copper complexes and the use of 1,3-diimine copper complexes for the deposition of copper on substrates or in or on porous solids in an atomic layer deposition process.
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