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Plasma processing method for forming a silicon nitride film on a silicon oxide film
Plasma processing method for forming a silicon nitride film on a silicon oxide film
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机译:在氧化硅膜上形成氮化硅膜的等离子体处理方法
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摘要
A plasma processing method for forming a silicon nitride film on a silicon oxide film, the method including preparing a substrate on which the silicon oxide film is formed; generating plasma by supplying a nitrogen gas onto the silicon oxide film; and nitride-processing the silicon oxide film by the plasma so as to modify an upper portion of the silicon oxide film into the silicon nitride film.
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