A block copolymer film (102) is formed on a substrate (101). The block copolymer film (102) is annealed under an inert gas atmosphere such as a neon atmosphere. Thus, the outside (mainly on the upper side) of the block copolymer film (102) is brought into an unpolarized state, whereby, for example, a hydrophobic monomer unit is strongly drawn toward the outside of the block copolymer film (102) and self-assembly is accelerated. Consequently, the throughput of pattern formation by the self-assembly of the block copolymer film (102) is improved.
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