A Modified Block Copolymer Nano-Patterning Method for High Density Sub-30 nm Polystyrene Nanosphere and Gold Nanomesh Formation

摘要

The use of self-assembled block copolymer structures to direct producing mesoscopic (1-100 nm) features requires potentially lower cost and can also be applied for large scale method as compared to conventional lithographic techniques, which may attracts many research interests. Here we demonstrate a simple, uniform, ease to control and efficient single step process to prepare polystyrene nanospheres based on the modified block copolymer nanopatterning with a diameter of 30 nm. The density of closely packed PS nanosphere was as high as 10~(11)/cm~(2). The formation of PS nanospheres was insensitive to the immersion temperature and time. The interiors of the resulting mask technique features have been developed to prepare large scale arrays of Au nanomesh on substrate at room temperature with lesser processing cost. Our result shows that the transmission rate of gold nanomesh was very similar to that of ITO. This technique provides an effective way to fabricate, control and reproduce plasmonic metal nanostructures with tunable surface plasmon resonances.