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COMPLEMENTARY METAL-OXIDE SEMICONDUCTOR(CMOS) FIELD-EFFECT TRANSISTOR HAVING DUAL WORK FUNCTION GATE AND METHOD OF MANUFACTURING THE SAME
COMPLEMENTARY METAL-OXIDE SEMICONDUCTOR(CMOS) FIELD-EFFECT TRANSISTOR HAVING DUAL WORK FUNCTION GATE AND METHOD OF MANUFACTURING THE SAME
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机译:具有双重工作功能门的互补金属氧化物半导体场效应晶体管及其制造方法
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摘要
PURPOSE: A CMOS transistor with a dual work function gate and a method for manufacturing the same are provided to reduce at least two steps of a lithography process by forming an NMOS transistor and a PMOS transistor gate symmetrically by spacer etching method. CONSTITUTION: A semiconductor substrate(100) is divided into a first area(140a) and a second area(150a). An NMOS transistor is formed in the first area. A PMOS transistor is formed in the second area. The NMOS transistor includes a first gate pattern(125), a second gate pattern(135), a source/drain area of n-type and an NMOS gate. The first gate pattern and the second gate pattern are in the form of spacer shapes. The source/drain region of n-type is formed in the both side of the NMOS gate of the semiconductor substrate. The PMOS transistor includes a PMOS gate and a source/drain region of p-type formed in the both side of the PMOS gate of the semiconductor substrate.
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