首页> 外国专利> THIN FILM TRANSISTOR REDUCING A CONTACT RESISTANCE OF SOURCE AND DRAIN ELECTRODES AND AN OXIDE SEMICONDUCTOR LAYER, AND A FLAT DISPLAY DEVICE INCLUDING THE SAME

THIN FILM TRANSISTOR REDUCING A CONTACT RESISTANCE OF SOURCE AND DRAIN ELECTRODES AND AN OXIDE SEMICONDUCTOR LAYER, AND A FLAT DISPLAY DEVICE INCLUDING THE SAME

机译:薄膜晶体管减小了源极和漏极电极和氧化物半导体层的接触电阻,以及包括该元件的平板显示装置

摘要

PURPOSE: A thin film transistor and a flat display device including the same are provided to implement a large flat display device with high image quality by improving a current-voltage property by a copper wiring with small resistivity by interposing a titanium layer between the source and drain electrodes and the oxide semiconductor layer.;CONSTITUTION: A gate electrode(12) is formed on a substrate(10). A gate insulation layer(13) is formed on the upper side including the gate electrode. An oxide semiconductor layer(14) is formed on the gate insulation layer including the gate electrode. A titanium layer(15) is formed on a source area(14a) and a drain area(14b) of the oxide semiconductor layer. A source electrode(16a) and a drain electrode(16b) are connected to the source region and the drain region through the titanium layer.;COPYRIGHT KIPO 2010
机译:目的:提供一种薄膜晶体管和包括该薄膜晶体管的平板显示装置,以通过在源极和源极之间插入钛层,通过电阻率小的铜布线来改善电流-电压特性,从而实现具有高图像质量的大型平板显示装置。组成:栅电极(12)形成在衬底(10)上。在包括栅电极的上侧上形成栅绝缘层(13)。在包括栅电极的栅绝缘层上形成氧化物半导体层(14)。在氧化物半导体层的源极区域(14a)和漏极区域(14b)上形成钛层(15)。源电极(16a)和漏电极(16b)通过钛层连接到源区和漏区。COPYRIGHTKIPO 2010

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号